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Material

H                                 He
Li Be                     B C N O F Ne
Na Mg                      Al Si P S Cl Ar
K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge As Sc Br Kr
Rb Sr Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe
Cs Ba La Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn
Fr Ra Ac Rf Db Sg Bh Hs Mt Ds Rg Cn Nh Fl Mc Lv Ts Og

Composition

NiAl Ni2Al3 Ni3Al              
PtMo Pt2Mo PtTe              
Ru3Re Ru3Ta Ru2W RuTa RuTa3          
TaBN TaTeN TaCo Ta2Co            
SiGe1 (17.7% Ge) SiGe2 (40.3% Ge)              
SiO2                  

 

EUV Radiometry beamline
The EUV radiometry beamline at the metrology light source (MLS 2013)

All experiments for the determination of optical constants were conducted in the Physikalisch-Technische Bundesanstalt (PTB) laboratory at the electron storage ring Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung (BESSY II) and the metrology light source (MLS).

The data provided here are freely available. You may interpolate them, print them, bury them or shout them out of the window if you feel like it. Citations are always welcome.
If you have any questions, or if you have noticed errors, or if your data shows significant deviations, please do not hesitate to contact us.

Victor Soltwisch 2023

Warning:

All optical constants provided here were determined in reflection from thin films (20 nm - 50 nm). The density of these films may be different (mostly lower) from the tabulated densities of the materials. Depending on the system, a scaling of the optical constants via the density may be necessary for your simulation.